C Stephen Dondale

Title: C Stephen Dondale: Innovator in Integrated Circuit Technology

Introduction

C Stephen Dondale is a notable inventor based in Ft. Collins, CO (US). He has made significant contributions to the field of integrated circuit technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

Dondale's latest patents include a "Method and apparatus for creating a reliable long RC time constant" and "An electrostatic discharge (ESD) structure for use in an integrated circuit (IC)." The ESD structure features a metallic resistor and capacitor that are electrically coupled in series, forming a resistor-capacitor (RC) component with an appropriate RC time constant. This design ensures that during an ESD event, electrostatic charge is effectively shunted from the power supply to ground, eliminating charge leakage issues associated with traditional RC components. His second patent, "Method for increasing power supply bypassing while decreasing chip layer," presents a method for enhancing layer density uniformity across a conductive layer in integrated circuits. This is achieved by tiling capacitors between functional blocks, which helps reduce power supply switching noise.

Career Highlights

C Stephen Dondale is currently employed at Agilent Technologies, Inc., where he continues to develop innovative solutions in the field of electronics. His work has had a significant impact on the reliability and efficiency of integrated circuits.

Collaborations

Dondale has collaborated with notable colleagues such as Guy Harlan Humphrey and Richard A Krzyzlowski, contributing to advancements in integrated circuit technology.

Conclusion

C Stephen Dondale's contributions to integrated circuit technology through his patents and work at Agilent Technologies, Inc. highlight his role as an influential inventor in the field. His innovative solutions continue to shape the future of electronics.