San Jose, CA, United States of America

C S Teng


Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 60(Granted Patents)


Company Filing History:


Years Active: 1997-1999

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2 patents (USPTO):Explore Patents

Title: Innovations by C S Teng

Introduction

C S Teng is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor technology, holding two patents that address critical challenges in the industry. His work is recognized for its innovative approaches to enhancing electronic device performance.

Latest Patents

C S Teng's latest patents include a method for protecting nonsilicided surfaces from silicide formation. This invention addresses problems associated with forming silicided and nonsilicided structures on the same silicon substrate. By utilizing a spacer oxide masking technique, a protective spacer oxide layer is deposited over the silicon substrate surface. A silicide exclusion photoresist mask is selectively developed, allowing for the etching of the spacer oxide layer in regions where silicides are expected to form. This method effectively prevents silicide formation in masked areas, ensuring the integrity of the silicon substrate.

Another significant patent by Teng involves low voltage triggering silicon controlled rectifier (SCR) structures for electrostatic discharge (ESD) protection. These SCR structures are triggered by lightly doped diffusion junction breakdown voltages of approximately 4-10 V. This innovation eliminates the need for additional protection elements found in conventional SCR-based ESD protection circuits, thereby minimizing RC delay on the signal line and reducing circuit size. The SCR structures are compatible with existing CMOS processes and are scalable to submicron technology.

Career Highlights

C S Teng has had a distinguished career at National Semiconductor Corporation, where he has contributed to various projects and innovations in semiconductor technology. His expertise in the field has made him a valuable asset to the company.

Collaborations

Throughout his career, C S Teng has collaborated with notable colleagues, including Hung-Sheng Chen and Chin-Miin Shyu. These collaborations have further enhanced his contributions to the field and fostered innovation within the team.

Conclusion

C S Teng's work exemplifies the spirit of innovation in semiconductor technology. His patents not only address existing challenges but also pave the way for future advancements in the industry. His contributions continue to impact the field positively.

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