Columbus, OH, United States of America

Byung C Kim


Average Co-Inventor Count = 3.4

ph-index = 5

Forward Citations = 112(Granted Patents)


Company Filing History:


Years Active: 1990-1994

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Byung C Kim: Innovator in Liquid Removal Technologies

Introduction

Byung C Kim is a notable inventor based in Columbus, OH (US). He has made significant contributions to the field of technology, particularly in the area of liquid removal methods. With a total of 5 patents to his name, Kim's work showcases his innovative approach to solving complex problems.

Latest Patents

One of Kim's latest patents is an apparatus and method for the removal of liquids. This invention features a first electrode arrangement and a transport element that are movable relative to a support. A working space is created between these movable elements to advance moist material along a processing path. As the moist material progresses, electrical current is passed through it between the first electrode arrangement and a second electrode arrangement adjacent to the transport element. Additionally, an acoustic transducer arrangement is positioned near the working space, which subjects the moist material to an acoustic field as it moves along the processing path. This acoustic field is generated by an array of acoustic transducers spaced along part of the processing path.

Career Highlights

Throughout his career, Byung C Kim has worked with reputable organizations, including the Battelle Memorial Institute. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking technologies.

Collaborations

Kim has collaborated with several professionals in his field, including Satya P Chauhan and Nagabhusan Senapati. These collaborations have likely enriched his work and led to innovative solutions in liquid removal technologies.

Conclusion

Byung C Kim is a distinguished inventor whose work in liquid removal technologies has made a significant impact. His innovative patents and collaborations highlight his dedication to advancing technology in this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…