Byoung-Suhk Kim

Title: Byoung-Suhk Kim: Innovator in Amphiphilic Telechelic Polymers

Introduction

Byoung-Suhk Kim is a notable inventor based in Jeonju-si, South Korea. He has made significant contributions to the field of polymer science, particularly in the development of amphiphilic telechelic polymers. His innovative work has implications for various applications, including surfactants and additives in plastics.

Latest Patents

Byoung-Suhk Kim holds a patent for "Nonionic telechelic polymers incorporating polyhedral oligosilsesquioxane (POSS) and uses thereof." This patent describes the synthesis of amphiphilic telechelics through direct urethane linkage between the diol end groups of polyethylene glycol (PEG) homopolymers and the monoisocyanate group of POSS macromers. The hydrophobicity of these telechelics can be adjusted by varying the molecular weight of the PEG homopolymers, allowing for precise control over their molecular architecture. The patent also discloses methods for synthesizing these telechelics and their applications as surfactants, thickening agents, and additives to materials such as PMMA and epoxy adhesives.

Career Highlights

Byoung-Suhk Kim is affiliated with the University of Connecticut, where he continues to advance research in polymer science. His work has garnered attention for its innovative approach to modifying polymer properties and enhancing material performance.

Collaborations

He has collaborated with notable colleagues, including Patrick T Mather and Qing Ge, contributing to a dynamic research environment that fosters innovation and discovery.

Conclusion

Byoung-Suhk Kim's contributions to the field of polymer science, particularly through his patent on amphiphilic telechelic polymers, highlight his role as a significant inventor. His work not only advances scientific understanding but also opens new avenues for practical applications in various industries.