Company Filing History:
Years Active: 2011-2012
Title: Byoung-Ho Choi: Innovator in Polymer Foam Technology
Introduction
Byoung-Ho Choi is a notable inventor based in Uijeongbu-si, South Korea. He has made significant contributions to the field of polymer technology, particularly in the development of advanced foam materials. With a total of 2 patents to his name, Choi's work has had a considerable impact on various industries.
Latest Patents
Choi's latest patents include a method of forming extruded polystyrene foams and the products made therefrom. This invention describes a method for creating complex shapes of styrenic polymer foams by utilizing a pressing surface, which is formed by planing or machining a layer of an extruded styrenic polymer plank. The plank is then contacted with a contoured die face and pressed to achieve the desired complex shape. Another significant patent is for a composite material and the method of making it. This invention features an improved energy-absorbing member that comprises a thermoplastic cellular polymer in contact with structural elements, such as metal guard rails or automotive doors. The cellular polymer is designed to have an average cell size of at least about 0.75 mm, ensuring high compressive efficiency.
Career Highlights
Throughout his career, Byoung-Ho Choi has worked with prominent companies, including Dow Global Technologies LLC and The Dow Chemical Company. His experience in these organizations has allowed him to refine his expertise in polymer technology and contribute to innovative solutions in the field.
Collaborations
Choi has collaborated with notable professionals in his field, including Myron J Maurer and Alain Michel Andre Sagnard. These collaborations have further enriched his work and expanded the scope of his inventions.
Conclusion
Byoung-Ho Choi is a distinguished inventor whose contributions to polymer foam technology have paved the way for advancements in various applications. His innovative patents reflect his commitment to enhancing material performance and functionality.