Company Filing History:
Years Active: 2018-2022
Title: Byeong Gyu Hwang: Innovator in Silica Layer Technology
Introduction
Byeong Gyu Hwang is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of silica layers. With a total of 2 patents, his work has implications for various applications in electronics and manufacturing.
Latest Patents
Hwang's latest patents include a composition for forming a silica layer and a manufacturing method for the silica layer. The first patent provides a composition that contains a silicon-containing polymer and a solvent. This composition is designed to create a silica layer that meets specific criteria defined in the patent specification. The second patent elaborates on the composition for forming a silica layer, detailing that the silicon-containing polymer has a weight average molecular weight ranging from about 2,000 to about 100,000. Additionally, it specifies a branching ratio of the polymer calculated by a defined equation.
Career Highlights
Hwang is currently employed at Samsung SDI Co., Inc., where he continues to innovate in the field of materials science. His work at this leading technology company allows him to collaborate with other experts and contribute to cutting-edge research and development.
Collaborations
Some of Hwang's notable coworkers include Kunbae Noh and Taeksoo Kwak. Their collaborative efforts enhance the research environment and foster innovation within their projects.
Conclusion
Byeong Gyu Hwang's contributions to silica layer technology exemplify the importance of innovation in materials science. His patents reflect a commitment to advancing technology in the electronics sector.