Company Filing History:
Years Active: 2000
Title: Burford J Furman: Innovator in Chemical Mechanical Planarization
Introduction
Burford J Furman is a notable inventor based in Mountain View, CA, who has made significant contributions to the field of Chemical Mechanical Planarization (CMP). With a total of two patents to his name, Furman's work focuses on enhancing the efficiency and effectiveness of polishing processes for various applications.
Latest Patents
Furman's latest patent is an apparatus and method for polishing a flat surface using a belted system. This invention relates to CMP for wafers, flat panel displays (FPD), and hard drive disks (HDD). The preferred apparatus features a looped belt oriented vertically with respect to the ground floor. A polishing pad is affixed to the outer surface of the belt, while the inner surface contains multiple wafer supports to hold the wafers during the polishing process. Wafers are transferred from a wafer station to a wafer head using a handling structure before polishing and are returned to the wafer station after the process. An electric motor drives the looped belt over two pulleys, and an adjustment mechanism is included to fine-tune the belt's tension and position for optimal performance. This innovative CMP machine can be mounted in various orientations, allowing for space-saving manufacturing solutions.
Career Highlights
Furman is currently employed at Aplex, Inc., where he continues to develop and refine technologies related to CMP. His work has been instrumental in advancing the capabilities of polishing equipment used in the semiconductor and electronics industries.
Collaborations
Some of Furman's coworkers include Albert Hu and Mohamed Abushaban, who contribute to the collaborative environment at Aplex, Inc. Their combined expertise fosters innovation and drives the development of cutting-edge technologies.
Conclusion
Burford J Furman is a distinguished inventor whose work in Chemical Mechanical Planarization has led to significant advancements in the field. His innovative approach and dedication to improving polishing processes continue to impact the industry positively.