Company Filing History:
2 out of 131,611 
1 out of 6 Years Active: 2013-2014
Title: Bum-Hyun An: Innovator in Photomask Technology
Introduction
Bum-Hyun An is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 2 patents. His work has been instrumental in advancing the capabilities of lithography processes used in semiconductor manufacturing.
Latest Patents
Among his latest patents are two innovative designs. The first patent is for a pellicle that includes a frame with a square shape and a buffer zone that divides the lower surface of the frame into multiple portions. The second patent focuses on a pellicle frame made from aluminum, aluminum oxide, and a transition metal, which enhances the performance of photomasks in lithography apparatus.
Career Highlights
Bum-Hyun An has worked with prominent companies in the technology sector, including Samsung Electronics and Fine Semitech Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge projects in the semiconductor industry.
Collaborations
Throughout his career, Bum-Hyun An has collaborated with talented individuals such as Jung-jin Kim and Chan-Uk Jeon. These partnerships have fostered innovation and have been crucial in the development of his patented technologies.
Conclusion
Bum-Hyun An's contributions to photomask technology and his innovative patents reflect his expertise and dedication to the field. His work continues to influence advancements in semiconductor manufacturing processes.