Company Filing History:
Years Active: 1996-1998
Title: Buh-Luen Chen: Innovator in Photo-Induced DNA-Cleaving Agents
Introduction
Buh-Luen Chen is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of chemistry, particularly in the development of photo-induced DNA-cleaving agents. With a total of 2 patents to his name, his work has implications for various scientific applications.
Latest Patents
Chen's latest patents focus on a composition of photo-induced DNA-cleaving agents. This composition comprises N-aryl-N-(alkyl or arylalkyl)hydroxylamine, which is stable in the dark but reacts with O₂ to form HO· radicals when exposed to UV light for 2-3 hours. These radicals then interact with DNA, facilitating its cleavage. The detailed formula and components of this invention highlight its innovative approach to DNA manipulation.
Career Highlights
Buh-Luen Chen is affiliated with the National Science Council, where he continues to advance his research and development efforts. His work is characterized by a commitment to exploring new chemical compositions and their potential applications in biotechnology and medicine.
Collaborations
Chen has collaborated with esteemed colleagues, including Jih Ru Hwu and Shwu-chen Tsay, who contribute to his research endeavors. Their combined expertise enhances the quality and impact of their scientific work.
Conclusion
Buh-Luen Chen's contributions to the field of photo-induced DNA-cleaving agents exemplify the innovative spirit of modern science. His patents and collaborations reflect a dedication to advancing knowledge and technology in chemistry.