Company Filing History:
Years Active: 1994-1996
Title: Innovations by Bu-Chin Chung in Plasma Etching Technology
Introduction
Bu-Chin Chung is a notable inventor based in Saratoga, California, recognized for his contributions to plasma etching technology. With a total of two patents to his name, Chung has made significant advancements in the field, particularly in the development of equipment and processes that enhance the efficiency of oxide etching.
Latest Patents
Chung's latest patents include a groundbreaking plasma etch equipment and a novel plasma etch process. The plasma etch equipment patent describes a microwave-powered electron cyclotron resonance reactor that utilizes a low-pressure, high electron density plasma for rapid oxide etching. This innovative design incorporates an alumina-coated quartz dielectric microwave window, which effectively couples microwave energy into the etch chamber while preventing oxygen contamination. The etch chamber side of the dielectric microwave window is specifically coated with alumina to ensure optimal performance.
The plasma etch process patent outlines a method that employs low-pressure plasma with high electron density for rapid oxide etching. This process utilizes hydrogen and argon, along with specific electron cyclotron resonance operating parameters, in an environment that does not contribute oxygen within the reaction chamber.
Career Highlights
Chung's career is marked by his work at Varian Associates, Inc., where he has played a pivotal role in advancing plasma etching technologies. His expertise in this area has positioned him as a key figure in the development of innovative solutions for semiconductor manufacturing.
Collaborations
Chung has collaborated with esteemed colleagues such as Siamak Salimian and Michelangelo Delfino, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Bu-Chin Chung's contributions to plasma etching technology through his patents and work at Varian Associates, Inc. highlight his significant impact on the field. His innovative approaches continue to shape the future of semiconductor manufacturing.
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