Company Filing History:
2 out of 13,726 
1 out of 832,880 Years Active: 2002-2005
Title: Innovations of Brian Sy Yuan Shieh
Introduction
Brian Sy Yuan Shieh is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor processing, particularly in the area of dielectric etching. With a total of three patents to his name, his work has advanced the technology used in multichamber substrate processing systems.
Latest Patents
One of his latest patents is focused on a system-level in-situ integrated dielectric etch process that is particularly useful for copper dual damascene. This innovative process is performed in a multichamber substrate processing system that includes first and second etching chambers. The process involves transferring a substrate with a patterned photoresist mask, a dielectric layer, a barrier layer, and a feature to be contacted into the first chamber. Here, the dielectric layer is etched in a manner that promotes polymer formation over a roughened interior surface. The substrate is then moved to the second chamber under vacuum conditions, where it is exposed to a reactive plasma, such as oxygen, to strip away the photoresist mask. After this step, the barrier layer is etched to reach the feature in the substrate, all while maintaining a system-level in-situ process to prevent exposure to ambient conditions between steps.
Career Highlights
Brian has worked with several prominent companies in the semiconductor industry, including Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in substrate processing.
Collaborations
Throughout his career, Brian has collaborated with notable professionals in the field, including Gerald Zheyao Yin and Lee Luo. These collaborations have further enriched his work and innovations.
Conclusion
Brian Sy Yuan Shieh is a distinguished inventor whose contributions to dielectric etching processes have significantly impacted the semiconductor industry. His innovative patents and career achievements reflect his expertise and dedication to advancing technology.