Brian Shieh

Title: **Innovator Spotlight: Brian Shieh**

Introduction

Brian Shieh, an esteemed inventor located in Hualien, Taiwan, has made significant contributions to the field of plasma processing technology. With a total of three patents to his name, Shieh's work emphasizes advanced methodologies in improving semiconductor processes through innovative apparatus and treatments. His inventions reflect a commitment to pushing the boundaries of technology in the semiconductor industry.

Latest Patents

Brian Shieh's latest patents include a groundbreaking design of a **Gas Injection Slit Nozzle for a Plasma Process Reactor**. This invention entails a sophisticated gas injection apparatus tailored for injecting gases into a plasma reactor vacuum chamber. This unique apparatus comprises a gas supply containing an etchant species, an opening in the chamber housing, and gas distribution apparatus designed with slit nozzles to enhance gas flow and efficiency. With components made from materials impervious to etchant species, such as ceramic and quartz, this invention exemplifies Shieh's dedication to developing durable and efficient semiconductor processing tools.

Another notable patent is related to a method for **Passivating, Stripping, and Corrosion Inhibition of Semiconductor Substrates**. This innovative process allows for the effective passivation of etched substrates, employing a multicycle protocol that integrates passivating and stripping steps to ensure optimal substrate conditions. By utilizing various gases and plasma technology, Shieh's approach enhances the treatment of semiconductor materials, making them more resilient and effective for further applications.

Career Highlights

Brian Shieh contributes his innovative skills at **Applied Materials, Inc.**, a leading company in the semiconductor manufacturing sector. His work has positioned him as a prominent figure in the field, where he continues to develop technologies that advance semiconductor processing capabilities. With three patents attributed to his name, Shieh’s contributions remain crucial to industry advancements.

Collaborations

Throughout his career, Shieh has collaborated with several notable professionals, including Steve S. Mak and James S. Papanu. These collaborations not only underscore the spirit of teamwork in innovation but also highlight the synergy between experts that leads to groundbreaking technological developments. Working alongside talented colleagues enables Shieh to forge new paths in semiconductor technology.

Conclusion

Brian Shieh's inventive spirit and technical insights have propelled him to the forefront of semiconductor innovation. With a keen focus on improving plasma processing techniques through his latest patents, Shieh embodies the essence of creativity and practicality in engineering. His contributions to **Applied Materials, Inc.** and collaborations with fellow innovators play a significant role in shaping the future of semiconductor technology.