Company Filing History:
Years Active: 2013
Title: Innovations of Brian Bilenberg in Electron Beam Lithography
Introduction
Brian Bilenberg is a notable inventor based in Ølstykke, Denmark. He has made significant contributions to the field of electron beam lithography, a technology that plays a crucial role in the production of high-quality micro-patterns on substrates.
Latest Patents
Bilenberg holds a patent for a method for performing high-speed electron beam lithography. This invention relates to a technique that utilizes an electron beam source capable of emitting an electron beam towards energy-sensitive resist. The method allows for the formation of overlapping patterns on a substrate, which enhances the efficiency and quality of the produced patterns, such as hole or dot arrays.
Career Highlights
Brian Bilenberg is associated with Nil Technology Aps, where he applies his expertise in electron beam lithography. His innovative approach has led to advancements in the production of substrates with high-quality developed patterns.
Collaborations
Bilenberg has collaborated with notable colleagues, including Theodor Kamp Nielsen and Peixiong Shi, contributing to the advancement of technologies in their field.
Conclusion
Brian Bilenberg's work in electron beam lithography exemplifies the impact of innovative methods in technology. His contributions continue to influence the development of high-speed lithography techniques, showcasing the importance of innovation in modern manufacturing processes.