Company Filing History:
Years Active: 2011-2013
Title: The Innovative Contributions of Bradley M. Davis
Introduction
Bradley M. Davis is a notable inventor based in Fukushima-ken, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his expertise and innovative spirit. His work primarily focuses on enhancing the manufacturing processes of semiconductor devices.
Latest Patents
One of his latest patents is titled "Gate trim process using either wet etch or dry etch approach to target CD for selected transistors." This patent discloses methods and devices for targeting critical dimensions (CD) of selected transistors in a semiconductor device. The process involves forming hard mask lines in a hard mask layer with varying amounts of spacer material. Hard mask lines corresponding to selected transistors can be either covered or uncovered by a resist applied over the hard mask layer. Subsequently, spacer material is selectively removed from the hard mask lines to vary their width and associated side wall spacers. Finally, a gate layer is etched through the spaces in the hard mask lines to create gate lines with varying widths and targeted CD.
Career Highlights
Bradley M. Davis is currently employed at Spansion LLC, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing innovative solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Bradley has collaborated with talented individuals such as Jihwan Choi and Angela Tai Hui. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Bradley M. Davis exemplifies the spirit of innovation in the semiconductor industry. His patents and contributions reflect a commitment to advancing technology and improving manufacturing processes. His work continues to influence the field and inspire future innovations.