Location History:
- Cambridge, MA (US) (2009)
- Lexington, MA (US) (2010 - 2013)
Company Filing History:
Years Active: 2009-2013
Title: Booyong S Lim: Innovator in Atomic Layer Deposition
Introduction
Booyong S Lim is a notable inventor based in Lexington, MA (US), recognized for his contributions to the field of atomic layer deposition. With a total of three patents to his name, Lim has made significant advancements in the deposition of metal films, which are crucial for various applications in microelectronics and magnetic information storage devices.
Latest Patents
Lim's latest patents focus on atomic layer deposition using metal amidinates. His innovative approach allows for the deposition of metal films with uniform thickness and excellent step coverage. For instance, copper metal films are deposited on heated substrates through the reaction of alternating doses of copper(I) NN'-diispropylacetamidinate vapor and hydrogen gas. Similarly, cobalt metal films are created using cobalt(II) bis(N,N'-diispropylacetamidinate) vapor and hydrogen gas. By substituting hydrogen with ammonia or water vapor, nitrides and oxides of these metals can also be formed. The films produced exhibit very uniform thickness and excellent step coverage, even in narrow holes. These advancements have suitable applications in electrical interconnects in microelectronics and magnetoresistant layers in magnetic information storage devices.
Career Highlights
Throughout his career, Booyong S Lim has worked with prestigious institutions, including Harvard College and Harvard Corporation. His work has significantly impacted the field of materials science and engineering, particularly in the development of advanced deposition techniques.
Collaborations
Lim has collaborated with notable individuals in his field, including Roy Gerald Gordon, enhancing the research and development of innovative technologies.
Conclusion
Booyong S Lim's contributions to atomic layer deposition and metal film technology have established him as a prominent figure in the field. His patents reflect a commitment to advancing microelectronics and magnetic information storage solutions.