Wetter, Germany

Björn Lunau


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Björn Lunau in Electromagnetic Radiation Attenuation

Introduction

Björn Lunau is an innovative inventor based in Wetter, Germany. He has made significant contributions to the field of electromagnetic radiation attenuation through his patented technology. His work focuses on creating materials that effectively reduce electromagnetic interference, which is crucial in various applications.

Latest Patents

Björn Lunau holds a patent for a reflective layer designed to attenuate electromagnetic radiation. This layer comprises at least one reflective component selected from substances such as carbon particles or fibers, metal particles, and metal alloy particles. The reflective layer is characterized by its ability to attenuate electromagnetic radiation in the 200Hz to 10 GHz range by more than 10 dB. Additionally, it is watertight, permeable to water vapor, resistant to the elements, and designed to produce potential compensation. The invention also includes a method for assembling the reflective layer.

Career Highlights

Björn Lunau is associated with Ewald Dorken AG, where he applies his expertise in developing innovative solutions. His work has garnered attention for its practical applications in reducing electromagnetic interference, which is increasingly important in today's technology-driven world.

Collaborations

Björn has collaborated with notable colleagues, including Gilles Schwaab and Jörn Schröer. Their combined efforts contribute to the advancement of technology in the field of electromagnetic radiation attenuation.

Conclusion

Björn Lunau's innovative work in developing a reflective layer for electromagnetic radiation attenuation showcases his commitment to advancing technology. His contributions are vital in addressing the challenges posed by electromagnetic interference in various applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…