Company Filing History:
Years Active: 2003
Title: The Innovative Contributions of Bin Xie
Introduction
Bin Xie is a notable inventor based in Lund, Sweden. He has made significant contributions to the field of etching technology, particularly in the development of methods that enhance the efficiency and effectiveness of substrate processing. His work is characterized by a focus on electrochemical etching techniques that improve circuit pattern transfer.
Latest Patents
One of Bin Xie's key patents is titled "Method of etching, as well as frame element, mask and prefabricated substrate element for use in such etching." This patent describes a method for etching a substrate with a conductive surface layer. The innovative approach involves transferring a circuit pattern to the substrate's surface layer using electrochemical etching. To mitigate excessive current densities at the edges of the central surface area during the etching process, a specially designed frame is utilized. This frame can either be a separate element placed on the substrate or integrated into a resist coating, showcasing the versatility of his invention.
Career Highlights
Bin Xie is associated with Obducat Aktiebolag, a company known for its advancements in nanotechnology and lithography. His role at Obducat has allowed him to further develop his innovative ideas and contribute to the company's mission of providing cutting-edge solutions in the field of microfabrication.
Collaborations
Throughout his career, Bin Xie has collaborated with esteemed colleagues such as Per Petersson and Mikael Gustavsson. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology.
Conclusion
Bin Xie's contributions to the field of etching technology exemplify the impact of innovative thinking in advancing industrial processes. His patent and work at Obducat Aktiebolag highlight the importance of collaboration and creativity in driving technological progress.