Bevan D Staple

Title: Bevan D Staple: Innovator in Capacitance Pressure Sensors

Introduction

Bevan D Staple is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of microelectromechanical systems (MEMS), particularly in the development of capacitance pressure sensors. His innovative work has led to the creation of a patented technology that integrates electronic circuitry with pressure sensing capabilities.

Latest Patents

Bevan D Staple holds a patent for a capacitance pressure sensor. This invention involves a microelectromechanical (MEM) capacitance pressure sensor that is integrated with electronic circuitry on a common substrate. The patent describes a method for forming such a device, which includes a capacitance pressure sensor formed at least partially in a cavity etched below the surface of a silicon substrate. Adjacent circuitry, which can be CMOS, BiCMOS, or bipolar circuitry, is formed on the substrate. By utilizing a cavity for the capacitance pressure sensor, the substrate can be planarized, allowing for standard integrated circuit processing steps to be employed in forming the electronic circuitry.

Career Highlights

Bevan D Staple is associated with Sandia Corporation, where he has contributed to various projects and innovations in the field of MEMS. His work has been instrumental in advancing the technology of pressure sensors, making them more efficient and effective for various applications.

Collaborations

Bevan has collaborated with notable colleagues such as William P Eaton and James H Smith. Their combined expertise has fostered an environment of innovation and development within their projects.

Conclusion

Bevan D Staple's contributions to the field of capacitance pressure sensors exemplify his dedication to innovation and technology. His patented work continues to influence advancements in microelectromechanical systems, showcasing the importance of integrating electronic circuitry with sensing technologies.