Company Filing History:
Years Active: 1982
Title: Beth G Wright: Innovator in Electrically Photosensitive Materials
Introduction
Beth G Wright is a prominent inventor based in Rochester, NY (US). She has made significant contributions to the field of electrically photosensitive materials, holding a total of 2 patents. Her work has advanced the understanding and application of polymeric compounds in various technologies.
Latest Patents
Wright's latest patents include innovative developments in electrically photosensitive materials. One of her patents focuses on electrically photosensitive materials and elements comprising an electrically photosensitive polymeric compound. This compound features a specific structure that allows for enhanced functionality. Another notable patent involves composite electrically photosensitive particles for electrophoretic applications. This invention provides novel composite particles that integrate colorants and polymeric binders, showcasing a range of chemical structures that enhance their performance.
Career Highlights
Beth G Wright has built her career at Eastman Kodak Company, where she has been instrumental in developing cutting-edge technologies. Her expertise in electrically photosensitive materials has positioned her as a leader in her field.
Collaborations
Throughout her career, Wright has collaborated with notable colleagues, including Hal E Wright and Stewart H Merrill. These partnerships have fostered innovation and contributed to the success of her projects.
Conclusion
Beth G Wright's contributions to the field of electrically photosensitive materials exemplify her dedication to innovation. Her patents reflect her expertise and commitment to advancing technology in this area.