Location History:
- Munich, DE (1991)
- Fishkill, NY (US) (1997)
Company Filing History:
Years Active: 1991-1997
Title: The Innovative Work of Bernhard Neureither in Microcrystalline Boron-Nitride Layers
Introduction
Bernhard Neureither, based in Munich, Germany, is an accomplished inventor known for his significant contributions to advanced materials science. With a portfolio of two patents, Neureither specializes in methods that enhance the performance and efficiency of semiconductor applications.
Latest Patents
Neureither's latest innovations include two notable patents:
1. **Method for Manufacturing Microcrystalline Cubic Boron-Nitride Layers**
This innovative method provides a simple technique to deposit boron nitride layers with a microcrystalline cubic structure. These layers serve as effective insulating layers in VLSI circuits, mask membranes for x-ray lithography, and coatings for hard substances. The use of excited starting substances that already contain boron and nitrogen in one molecule enables the deposition to occur at temperatures below 500°C using a plasma-CVD method.
2. **Method for Producing Silicon Boronitride Layers**
This method focuses on creating silicon boronitride layers utilized as intermetallization and final passivation layers. It employs fluid initial compounds that contain parts of the target composition of the silicon boronitride layer, which are deposited through chemical vapor deposition in an alternating electromagnetic field. The resulting layers have a dielectric constant below 4ε₀ and are characterized by their excellent insulating properties and high breakdown strength.
Career Highlights
Bernhard Neureither is a key figure at Siemens Aktiengesellschaft, where he applies his expertise to develop cutting-edge technologies in semiconductor materials. His innovative approaches have the potential to redefine insulation methods within the electronics industry.
Collaborations
Throughout his career, Neureither has collaborated with esteemed colleagues Helmuth Treichel and Oswald Spindler, contributing to the advancement of material technologies. Their collective efforts underscore the importance of teamwork in fostering innovation.
Conclusion
Bernhard Neureither's contributions to the field of materials science, especially through his patents related to microcrystalline boron-nitride layers and silicon boronitride layers, exemplify the impact of innovative methodologies on modern technology. His work continues to inform and influence developments within semiconductor manufacturing, paving the way for future advancements.