Daejeon, South Korea

Beon Sik Kim


 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Beon Sik Kim: Innovator in Carbon Dioxide Reforming Technology

Introduction

Beon Sik Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of chemical technology, particularly in the area of carbon dioxide reforming reactions. His innovative work has led to the development of a unique monolith catalyst that enhances the efficiency of these reactions.

Latest Patents

Beon Sik Kim holds 1 patent for his invention titled "Monolith catalyst for carbon dioxide reforming reaction, preparation method for same, and preparation method for synthesis gas using same." This patent focuses on a preparation method for a monolith catalyst specifically designed for methane reforming reactions using carbon dioxide. The method involves mixing and impregnating a support in a metal precursor solution, followed by coating a monolith substrate with the solution, drying it, and then calcining the coated substrate.

Career Highlights

Throughout his career, Beon Sik Kim has worked with esteemed organizations such as the Korea Research Institute of Chemical Technology and the International University of Chemical Technology. His work in these institutions has allowed him to advance his research and contribute to the field of chemical engineering.

Collaborations

Beon Sik Kim has collaborated with several professionals in his field, including Jeong Kwon Suh and Young Woo You. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Beon Sik Kim's contributions to carbon dioxide reforming technology exemplify the impact of innovative thinking in addressing environmental challenges. His work continues to inspire advancements in chemical technology and sustainable practices.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…