Beomsoo Park

Title: Innovations by Beomsoo Park in Processing Chamber Cleaning

Introduction

Beomsoo Park is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of processing chamber cleaning technology. His innovative work has led to the development of a patented method that enhances the efficiency of cleaning processes within processing chambers.

Latest Patents

Beomsoo Park holds a patent for "Methods and apparatus for processing chamber cleaning end point detection." This invention provides systems, methods, and apparatus for detecting a cleaning endpoint of a cleaning process performed within a processing chamber. The patent includes a spectrometer designed to measure the spectrum response over time of a cleaning reaction during the cleaning process. Additionally, it features a lens system that focuses on a selected area within the processing chamber and amplifies the intensity of radiation from that area. This selected area is strategically chosen based on its expected location for the last cleaning reaction.

Career Highlights

Beomsoo Park is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his expertise in developing advanced cleaning technologies that are crucial for maintaining the performance of processing chambers.

Collaborations

Throughout his career, Beomsoo Park has collaborated with notable colleagues, including Young-Jin Choi and Su Ho Cho. These collaborations have contributed to the advancement of technologies in the field of semiconductor manufacturing.

Conclusion

Beomsoo Park's innovative contributions to processing chamber cleaning technology exemplify the importance of advancements in this field. His patent and work at Applied Materials, Inc. highlight his role as a key inventor in enhancing cleaning processes within processing chambers.