Chicago, IL, United States of America

Benjamin F Ketter


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovations of Benjamin F. Ketter

Introduction

Benjamin F. Ketter is an accomplished inventor based in Chicago, IL (US). He is known for his significant contributions to the field of chemical engineering, particularly in the area of reactor effluent processing. His innovative approach has led to the development of a patented process that enhances the efficiency of chemical reactions.

Latest Patents

Ketter holds a patent for a "Process and apparatus for quenching a reactor effluent stream." This invention involves a method to cool and remove catalyst from a hot vaporous reactor effluent stream. The process includes feeding the hot vaporous reactor effluent stream, which contains catalyst, to a first quench chamber. The direct contact between the hot vaporous reactor effluent stream and the first quench liquid stream effectively cools the reactor effluent and washes the catalyst into the quench liquid. This innovative method improves the overall efficiency of chemical processing.

Career Highlights

Throughout his career, Ketter has made notable advancements in chemical engineering. His work at UOP LLC has positioned him as a key figure in the development of efficient chemical processes. His patent reflects his commitment to innovation and improving industrial practices.

Collaborations

Ketter has collaborated with esteemed colleagues such as Ernest James Boehm and Michael J. Tobin. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Benjamin F. Ketter's contributions to the field of chemical engineering exemplify the spirit of innovation. His patented process for quenching reactor effluent streams showcases his ability to solve complex engineering challenges. Ketter's work continues to influence the industry and inspire future advancements.

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