Company Filing History:
Years Active: 2001-2004
Title: The Innovative Contributions of Ben Pang
Introduction
Ben Pang is a notable inventor based in Oakland, CA, who has made significant contributions to the field of semiconductor processing. With a total of 4 patents to his name, he has developed innovative solutions that address critical challenges in the industry.
Latest Patents
One of Ben Pang's latest patents is a method and apparatus for cleaning an exhaust line in a semiconductor processing system. This apparatus is designed to prevent particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. It utilizes RF energy to excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state. This process allows the constituents to react and form gaseous products that can be pumped through the vacuum line. The apparatus includes a collection chamber that is structured to collect particulate matter flowing through it, effectively inhibiting the egress of this matter. Additionally, it features an electrostatic collector to enhance particle collection in the chamber and further prevent the escape of particulate matter.
Career Highlights
Ben Pang is currently employed at Applied Materials, Inc., where he continues to innovate and contribute to advancements in semiconductor technology. His work focuses on improving the efficiency and effectiveness of semiconductor processing systems.
Collaborations
Throughout his career, Ben has collaborated with talented individuals such as David Wingto Cheung and Mark A. Fodor. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Ben Pang's contributions to the semiconductor industry through his innovative patents and collaborative efforts highlight his role as a leading inventor. His work not only addresses current challenges but also paves the way for future advancements in technology.