Beibei Jiang

Title: Beibei Jiang: Innovator in Plasma Processing Technology

Introduction

Beibei Jiang is a prominent inventor based in Fremont, California. She has made significant contributions to the field of plasma processing technology, particularly in the area of etch processes for substrates. Her innovative approach has led to the development of a unique patent that addresses critical challenges in the industry.

Latest Patents

Beibei Jiang holds a patent titled "Multi-state RF pulsing to control mask shape and breaking selectivity versus process margin trade-off." This patent describes a method for performing an etch process on a substrate in a plasma processing system. The method includes applying source RF power and bias RF power to an electrode, where both powers are pulsed signals that define a series of multi-state pulsed RF cycles. Each cycle consists of three distinct states, allowing for precise control over the etching process.

Career Highlights

Beibei Jiang is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. Her work focuses on advancing plasma processing techniques, which are essential for the fabrication of integrated circuits. With her expertise, she has contributed to enhancing the efficiency and effectiveness of etching processes.

Collaborations

Throughout her career, Beibei has collaborated with talented professionals, including Nikhil Dole and Vikhram Vilasur Swaminathan. These collaborations have fostered a dynamic environment for innovation and have led to the successful development of new technologies in the field.

Conclusion

Beibei Jiang is a trailblazer in plasma processing technology, with a patent that showcases her innovative spirit and technical expertise. Her contributions to the industry continue to influence advancements in semiconductor manufacturing.