Bea-Jane L Yang

Title: Bea-Jane L Yang: Innovator in Photoresist Compositions

Introduction

Bea-Jane L Yang is a prominent inventor based in Yorktown Heights, NY (US). She has made significant contributions to the field of photoresist compositions, holding a total of 3 patents. Her work is particularly relevant in the realm of semiconductor manufacturing and materials science.

Latest Patents

One of her latest patents is focused on photoresist compositions of controlled dissolution rate in alkaline solutions. This invention discloses a mixture of a photoactive compound and an alkali-soluble resin binder, which comprises an unsaturated dicarboxylic acid esterified polymeric material. The composition includes a phenolic resin containing a plurality of acid esterifiable groups, which are esterified with an unsaturated dicarboxylic acid anhydride. Another notable patent involves a patterned resist and process, which includes a patterned image of a first resist polymeric material and a second different resist material on the first. This polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups, enhancing the versatility of the resist materials used in various applications.

Career Highlights

Bea-Jane L Yang is currently employed at International Business Machines Corporation (IBM), where she continues to innovate and develop new technologies. Her expertise in photoresist compositions has positioned her as a key player in the advancement of semiconductor technologies.

Collaborations

Throughout her career, Bea-Jane has collaborated with notable colleagues, including Kaolin N Chiong and Jer-Ming Yang. These collaborations have further enriched her research and development efforts in the field.

Conclusion

Bea-Jane L Yang is a distinguished inventor whose work in photoresist compositions has made a significant impact on the semiconductor industry. Her innovative patents and collaborations highlight her commitment to advancing technology and materials science.