Company Filing History:
Years Active: 2008-2010
Title: Innovations by Basanth Jaqannathan: A Beacon of Epitaxial Film Technology
Introduction
Basanth Jaqannathan is an accomplished inventor based in Beacon, NY, known for his significant contributions to the field of semiconductor technology. With a total of two patents to his name, Jaqannathan has made strides in the development of methods for depositing single crystal epitaxial films, which are crucial for advancing silicon-based technologies.
Latest Patents
One of Basanth Jaqannathan's most notable patents describes a method and apparatus for depositing single crystal, epitaxial films of silicon carbon and silicon germanium carbon on multiple substrates in a hot wall, isothermal UHV-CVD system. This innovative technique allows for low-temperature growth between 350°C to 750°C and incorporates carbon epitaxially in silicon and silicon-germanium films, creating very abrupt and well-defined junctions without oxygen background contamination. The patented method also allows these epitaxial SiC and SiGeC films to be doped in-situ, with the as-grown dopant profile able to withstand high furnace anneals (up to 850°C) and rapid thermal anneal temperatures (up to 1000°C).
Career Highlights
Basanth Jaqannathan is employed at International Business Machines Corporation (IBM), where he has played a pivotal role in semiconductor research and innovation. His work focuses primarily on the enhancement of epitaxial growth techniques, which have important implications for the performance of electronic devices.
Collaborations
Throughout his career, Jaqannathan has collaborated with notable colleagues, including Jack Oon Chu and Alfred Grill. These collaborations have fostered an environment of innovation and have contributed to the development of cutting-edge technologies within IBM.
Conclusion
Basanth Jaqannathan stands out as a key figure in the advancement of epitaxial film technology, with a focus on methods that support the burgeoning needs of the semiconductor industry. His patented innovations highlight the critical role that researchers and inventors play in pushing the boundaries of what is possible in technology.