Company Filing History:
Years Active: 2002
Title: Bart Scholte Van Mast: Innovator in Electron Beam Lithography
Introduction
Bart Scholte Van Mast is a notable inventor based in Pleasanton, CA (US). He has made significant contributions to the field of electron beam lithography, particularly with his innovative patent that enhances image conversion processes. His work is characterized by a focus on improving the efficiency and effectiveness of photoconversion devices.
Latest Patents
Bart Scholte Van Mast holds a patent titled "Moving photocathode with continuous regeneration for image conversion in electron beam lithography." This invention describes a moving photoconverter device that converts an incident light image into an equivalent electron or other charged particle beam image. The device is ring-shaped and is rotated using a motor, allowing the incident light image to expose a moving photoconverter surface. Additionally, the photoconverter can move in an X-Y motion or radially, with continuous regeneration provided at a site remote from the region of the moving photoconverter.
Career Highlights
Bart Scholte Van Mast is currently employed at Applied Materials, Inc., where he continues to develop and refine technologies related to electron beam lithography. His work has positioned him as a key player in advancing the capabilities of photoconversion devices in the semiconductor industry.
Collaborations
Throughout his career, Bart has collaborated with esteemed colleagues, including Lee H Veneklasen and Marian Mankos. These partnerships have fostered innovation and contributed to the successful development of advanced technologies in their field.
Conclusion
Bart Scholte Van Mast is a distinguished inventor whose work in electron beam lithography has made a significant impact on the industry. His innovative patent and contributions to Applied Materials, Inc. highlight his dedication to advancing technology in photoconversion devices.