Company Filing History:
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Years Active: 1994-1997
Title: Barbara J Sapjeta: Innovator in Etching Technologies
Introduction
Barbara J Sapjeta is a notable inventor based in Parsippany, NJ (US). She has made significant contributions to the field of etching technologies, holding a total of 3 patents. Her work has advanced the methods used in the production of copper-containing devices and titanium etching processes.
Latest Patents
One of her latest patents is focused on the etching of copper-containing devices. This innovation allows for better maintenance of linewidth in patterns produced by etching copper layers. The specific etching medium she developed includes aqueous hydrofluoric acid, copper chloride, and an additional chloride salt. This medium is particularly beneficial for bilayer metal constructions, such as the copper/titanium structure commonly found in multichip modules.
Another significant patent is a process for etching titanium at a controllable rate. This process involves the oxidation of titanium, which forms a complex in the etchant. As the concentration of this complex approaches its solubility limit, it precipitates and creates a film on the titanium surface. This film effectively reduces the etch rate, allowing for precise control over the amount of titanium removed.
Career Highlights
Barbara has worked with prominent companies such as AT&T Corp. and AT&T Bell Laboratories. Her experience in these organizations has contributed to her expertise in etching technologies and innovation.
Collaborations
Throughout her career, Barbara has collaborated with talented individuals, including Karrie Jo Hanson and Ken M Takahashi. These collaborations have likely enriched her work and led to further advancements in her field.
Conclusion
Barbara J Sapjeta is a pioneering inventor whose work in etching technologies has made a lasting impact. Her innovative patents and career achievements highlight her significant contributions to the industry.