Company Filing History:
Years Active: 1998-2001
Title: Ayako Sugase: Innovator in Electrophotosensitive Materials
Introduction
Ayako Sugase is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of electrophotosensitive materials, showcasing her innovative spirit and technical expertise. With a total of 2 patents, her work has garnered attention in the industry.
Latest Patents
Sugase's latest patents focus on the development of an electrophotosensitive material. This invention comprises a conductive substrate and a photosensitive layer, which includes a specific hole transferring material and/or electron transferring material, along with a binding resin of a polyester resin. The polyester resin is a substantially linear polymer derived from a specific dihydroxy compound. This innovative photosensitive material is designed to improve sensitivity while also enhancing adhesion to conductive substrates and mechanical strength, including wear resistance.
Career Highlights
Throughout her career, Ayako Sugase has worked with notable companies such as Mita Industrial Co., Ltd. and Kyocera Mita Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in her field.
Collaborations
Sugase has collaborated with esteemed colleagues, including Masato Katsukawa and Akiyoshi Urano. These partnerships have further enriched her work and expanded her impact in the realm of electrophotosensitive materials.
Conclusion
Ayako Sugase's innovative contributions to electrophotosensitive materials highlight her role as a leading inventor in her field. Her patents reflect her commitment to advancing technology and improving material performance.