Axel Feicke

Title: The Innovative Contributions of Axel Feicke

Introduction

Axel Feicke is a notable inventor based in Chemnitz, Germany. He has made significant contributions to the field of photomask production and patterning techniques. With a total of two patents to his name, Feicke's work has advanced the technology used in various applications.

Latest Patents

Feicke's latest patents include a method for producing a photomask and a method for determining an exposure dose and exposure apparatus. The first patent describes a process that involves applying two resists to a layer or mask substrate. This method allows for the creation of structures with varying depths by controlling the exposure doses of the resists. The second patent focuses on determining an exposure dose for writing patterns using an electron beam writer. It outlines a technique for adjusting the target dose in specific regions to achieve desired energy deposition levels.

Career Highlights

Feicke is currently employed at Advanced Mask Technology Center GmbH & Co. KG, where he continues to innovate in the field of photomask technology. His expertise has contributed to the development of advanced methods that enhance the precision and efficiency of patterning processes.

Collaborations

Feicke has worked alongside talented colleagues such as Markus Waiblinger and Timo Wandel. Their collaborative efforts have furthered the advancements in the technologies they are developing.

Conclusion

Axel Feicke's contributions to the field of photomask production and patterning techniques demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of the complexities involved in these processes, making him a valuable figure in the industry.