Aurelien Tavernier

Title: Aurelien Tavernier: Innovator in Substrate Etching Processes

Introduction

Aurelien Tavernier is a notable inventor based in East Palo Alto, California. He has made significant contributions to the field of substrate etching, particularly through his innovative patent.

Latest Patents

Aurelien Tavernier holds a patent for a "Cyclic oxide spacer etch process." This patent describes methods for etching a substrate, which can enhance patterning processes such as double and quadruple patterning. The embodiments include performing an inert plasma treatment to implant ions into a spacer material, followed by an etching process on the implanted region. This process can be repeated to achieve a predominantly flat top spacer profile. The inert plasma treatment may be biased, while the etching process is unbiased. Various processing parameters, including pressure, can be controlled to influence the desired spacer profile.

Career Highlights

Aurelien Tavernier is currently employed at Applied Materials, Inc., where he continues to develop innovative solutions in the field of semiconductor manufacturing. His work has contributed to advancements in etching technologies that are crucial for modern electronics.

Collaborations

Aurelien has collaborated with esteemed colleagues such as Qingjun Zhou and Tom K Choi, further enhancing the innovative environment at Applied Materials, Inc.

Conclusion

Aurelien Tavernier's contributions to substrate etching processes exemplify the importance of innovation in technology. His patent and collaborative efforts reflect a commitment to advancing the semiconductor industry.