Kyoto, Japan

Atsushi Osawa

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2005-2011

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Atsushi Osawa

Introduction

Atsushi Osawa is a noteworthy inventor based in Kyoto, Japan, recognized for his significant contributions to substrate processing technologies. With two patents to his name, Osawa has played a crucial role in advancing methodologies used in various industrial applications.

Latest Patents

Osawa's latest patents reflect his innovative approach in the field of substrate processing. His first patent, titled "Apparatus for and method of processing substrate," involves a substrate processing apparatus that efficiently discharges a hydrofluoric acid solution from strategically positioned discharge nozzles. This apparatus is designed to target the grooves in the side walls of an inner bath, allowing the hydrofluoric acid solution to diffuse and move towards the top portion of the inner bath. This innovative design ensures that metal components and foreign substances gracefully float to the surface without agitation, facilitating a rapid drainage process.

His second patent, "Substrate treating method and apparatus," outlines a method for treating substrates with a specialized solution. This method includes the heating of a treating solution containing sulfuric acid, which is then utilized to treat substrates coated with a high dielectric-constant material. By heating the treating solution prior to use, Osawa ensures that the treatment of the substrates is optimized, enhancing their performance and efficiency.

Career Highlights

Currently, Osawa is employed at Dainippon Screen Mfg. Co., Ltd., a leading company known for its innovative solutions in the manufacturing sector. His work has not only contributed to the advancement of substrate processing techniques but has also enhanced the company's reputation as a pioneer in the industry.

Collaborations

In his professional journey, Osawa collaborates with esteemed colleagues such as Yoshitaka Abiko and Masato Tanaka. Their collective expertise and innovative spirit foster a productive research environment that drives significant technological advancements.

Conclusion

Atsushi Osawa stands out as an influential inventor whose patents demonstrate a keen understanding of substrate processing technologies. Through his work at Dainippon Screen Mfg. Co., Ltd., and collaborative efforts with talented coworkers, Osawa continues to make impactful contributions to the field of innovations, solidifying his place among the notable inventors of his time.

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