Atsushi Ohta

Title: Innovations of Atsushi Ohta

Introduction

Atsushi Ohta is a notable inventor based in Shibata-gun, Japan. He has made significant contributions to the field of lithography and substrate conveyance technology. With a total of 5 patents, his work has had a considerable impact on the manufacturing processes in the semiconductor industry.

Latest Patents

Atsushi Ohta's latest patents include a substrate conveyance device and substrate conveyance method, as well as an exposure apparatus and exposure method. One of his key inventions is a lithographic projection apparatus that features a substrate table designed to hold a substrate. This apparatus includes a projection system that projects a patterned beam of radiation onto the substrate, a liquid supply system that provides liquid to the space between the projection system and the substrate, and a residual liquid detector that identifies any liquid remaining on the substrate or substrate table after exposure. Additionally, his substrate conveyance device is engineered to convey a substrate that has been exposed to a pattern image, incorporating a liquid detector to identify any liquid adhering to the substrate.

Career Highlights

Throughout his career, Atsushi Ohta has worked with prominent companies such as Nikon Corporation and Zao Nikon Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative technologies in the field of lithography.

Collaborations

Atsushi has collaborated with various professionals in his field, including his coworker Takashi Horiuchi. Their joint efforts have contributed to advancements in substrate conveyance and exposure methods.

Conclusion

Atsushi Ohta's contributions to the field of lithography and substrate conveyance are noteworthy. His innovative patents and collaborations have significantly influenced the semiconductor manufacturing industry.