Ames, IA, United States of America

Ashraf F Bastawros


Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2011-2017

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5 patents (USPTO):

Title: Innovations of Ashraf F Bastawros

Introduction

Ashraf F Bastawros is a notable inventor based in Ames, IA (US). He has made significant contributions to the field of electric-field imprinting technology. With a total of 5 patents to his name, his work focuses on creating advanced methods for producing micron and sub-micron patterns on various surfaces.

Latest Patents

One of his latest patents is titled "Method for focused electric-field imprinting for micron and sub-micron patterns on wavy or planar surfaces." This innovative process, known as Focused Electric Field Imprinting (FEFI), utilizes a focused electric field to guide both unplating and plating operations. The goal is to form very fine-pitched metal patterns on substrates. The FEFI process allows for the imprinting of patterns ranging from approximately 2000 microns to 20 microns in width, and depths from about 0.1 microns to over 10 microns. Some embodiments of this technology involve curving a proton-exchange membrane, with its shape adjusted using suction on a backing fluid through a support mask. Other variations employ a curved electrode. The interaction parameters between the mask and membrane, along with specific process settings, can generate features as small as sub-100-nm. The FEFI process is particularly effective on copper substrates, but it also performs well with other conductive materials.

Career Highlights

Throughout his career, Ashraf has worked with various companies, including Actus Potentia, Inc. His innovative approaches and dedication to advancing technology have positioned him as a key figure in his field.

Collaborations

He has collaborated with notable individuals such as Abhijit Chandra and Ambar K Mitra, contributing to the development of cutting-edge technologies.

Conclusion

Ashraf F Bastawros continues to push the boundaries of innovation in electric-field imprinting technology. His contributions are paving the way for advancements in the production of micron and sub-micron patterns, showcasing the potential of his patented methods.

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