West Chester, PA, United States of America

Ashish Aneja



Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2015

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3 patents (USPTO):Explore Patents

Title: Innovations by Inventor Ashish Aneja

Introduction

Ashish Aneja, an accomplished inventor based in West Chester, PA, holds an impressive portfolio of three patents. His work primarily focuses on advanced polymer blends that cater to the demands of high-performance applications.

Latest Patents

Among Aneja's latest innovations are his patents on polyaryl ether ketone polymer blends. These patents detail phase-separated blends composed of polyaryl ether ketones, polyaryl ketones, polyether ketones, and mixtures that include at least one polysulfone etherimide. Notably, the polysulfone etherimide is characterized by having at least 50 mole% of the polymer linkages containing an aryl sulfone group. The blends resulting from this innovative work demonstrate improved load-bearing capability at elevated temperatures, along with achieving high crystallization temperatures, especially when cooled at rapid rates.

Career Highlights

Throughout his career, Ashish Aneja has made significant contributions to the field of materials science. With a focus on polymers, his inventions pave the way for enhanced material performance in various industrial applications.

Collaborations

Aneja has collaborated with notable colleagues such as Robert Russell Gallucci and Roy Ray Odle, fostering an environment of innovation and creativity. These partnerships reflect his commitment to advancing the science of materials and developing cutting-edge solutions.

Conclusion

Ashish Aneja exemplifies the spirit of innovation in the field of engineering and materials science. His patents on polyaryl ether ketone polymer blends not only highlight his expertise but also contribute meaningfully to advancements in high-performance materials. With his ongoing research and development work, he continues to inspire the next generation of inventors and scientists.

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