Company Filing History:
Years Active: 2024
Title: Asako Anazawa: Innovator in Water and Oil Repellent Technologies
Introduction
Asako Anazawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of substrates with water and oil repellent properties. His innovative work has led to the filing of two patents that showcase his expertise and creativity.
Latest Patents
Anazawa's latest patents include a substrate with a water-and-oil repellent layer and a vapor deposition material. The first patent focuses on providing a substrate that features a water/oil repellent layer with excellent abrasion resistance. This invention includes a substrate, an undercoat layer, and a water/oil repellent layer arranged in that order. The second patent also emphasizes the creation of a substrate with a water repellent oil repellent layer, which similarly aims to enhance abrasion resistance. The water/oil repellent layer is composed of a condensate of a fluorinated compound with a reactive silyl group, while the undercoat layer contains silicon oxide along with boron and phosphorus.
Career Highlights
Anazawa is currently employed at AGC Inc., a leading company in the glass and chemicals industry. His work at AGC Inc. has allowed him to focus on innovative solutions that address the challenges of creating durable and effective water and oil repellent surfaces. His contributions have been instrumental in advancing the company's research and development efforts.
Collaborations
Anazawa collaborates with talented coworkers, including Yoshihito Tokunaga and Maemi Iwahashi. Their combined expertise fosters a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Asako Anazawa's work in the field of water and oil repellent technologies exemplifies the spirit of innovation. His patents reflect a commitment to enhancing material properties for practical applications. Anazawa's contributions continue to influence advancements in substrate technology.