Company Filing History:
Years Active: 1988
Title: Arvind T Halani: Innovator in Chemical Vapor Deposition and Solar Cell Technology
Introduction
Arvind T Halani is a notable inventor based in Canoga Park, CA (US). He has made significant contributions to the fields of chemical vapor deposition and solar cell technology. With a total of 2 patents, his work has had a meaningful impact on these industries.
Latest Patents
Halani's latest patents include innovative methods for applying zinc oxide films and enhancing solar cell interconnections. The first patent, titled "Chemical vapor deposition of zinc oxide films and products," describes a process where zinc oxide is applied to a substrate at low temperatures using a mixture of an organozinc compound and water carried in an inert gas. This method results in a zinc oxide film with relatively low resistivity, which can be adjusted by adding a group III element. The second patent, "Solar cell interconnection by discrete conductive regions," outlines a technique for connecting cells of a thin film solar module in series. This is achieved through discrete conductive regions that extend between the upper and lower electrodes of adjoining cells, with innovative methods for enhancing the interconnection process.
Career Highlights
Arvind T Halani is currently associated with Atlantic Richfield Company, where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the advancement of solar energy solutions and materials science.
Collaborations
Halani has collaborated with notable colleagues, including Gary B Turner and Don L Morel. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Arvind T Halani's contributions to chemical vapor deposition and solar cell technology exemplify his commitment to innovation. His patents reflect a deep understanding of materials science and renewable energy solutions. His work continues to influence the industry and pave the way for future advancements.