Arunima Deya Balan

Title: Arunima Deya Balan: Innovator in Selective Etching Technology

Introduction

Arunima Deya Balan is a prominent inventor based in Mountain View, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of selective etching processes. Her innovative work has led to the development of a patented method that enhances the efficiency of etching in silicon oxide regions.

Latest Patents

Arunima holds a patent titled "Selective etch using deposition of a metalloid or metal containing hardmask." This patent describes a method for selectively etching at least one feature in a silicon oxide region with respect to a lower oxygen-containing region. The process involves providing an etch gas that comprises a metalloid or metal-containing precursor and a halogen-containing component. This etch gas is then formed into a plasma, allowing for the selective etching of features in the silicon oxide region while simultaneously forming a metalloid or metal-containing hardmask over the lower oxygen-containing region. Arunima's innovative approach has the potential to improve the precision and effectiveness of semiconductor manufacturing.

Career Highlights

Arunima Deya Balan is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. Her work at Lam Research has allowed her to collaborate with other talented professionals in the field, further advancing her expertise and contributions to technology.

Collaborations

Some of Arunima's notable coworkers include Samantha Siamhwa Tan and Daniel Peter. Their collaborative efforts contribute to the innovative environment at Lam Research Corporation, fostering advancements in semiconductor technology.

Conclusion

Arunima Deya Balan is a remarkable inventor whose work in selective etching technology has made a significant impact in the semiconductor industry. Her patented methods and contributions continue to shape the future of semiconductor manufacturing.