Anton Vihervaara

Title: Anton Vihervaara: Innovator in Vapor Deposition Technologies

Introduction

Anton Vihervaara is a notable inventor based in Helsinki, Finland. He has made significant contributions to the field of vapor deposition technologies, holding a total of five patents. His work focuses on methods and systems for depositing noble metal-containing layers and elemental metal or semimetal-containing materials on substrates.

Latest Patents

One of Anton's latest patents is titled "Method and system for depositing noble metal-containing layer." This patent describes a cyclic deposition process that involves providing a substrate in a reaction chamber, introducing a noble metal precursor in vapor phase, and adding a second precursor to form noble metal-containing material on the substrate. The noble metal precursor includes a noble metal halide compound with an organic phosphine adduct ligand.

Another significant patent is related to "Vapor deposition processes." This patent outlines methods for depositing elemental metal or semimetal-containing materials on substrates through a cyclic deposition process. The method includes providing a substrate in a reaction chamber, introducing a metal or semimetal precursor in vapor phase, and adding a reducing agent to form the desired material on the substrate. The reducing agent comprises a cyclohexadiene compound with a germanium-containing substituent.

Career Highlights

Anton Vihervaara is currently employed at Asm IP Holding B.V., where he continues to innovate in the field of vapor deposition technologies. His expertise and contributions have positioned him as a key figure in the development of advanced materials and processes.

Collaborations

Throughout his career, Anton has collaborated with notable colleagues, including Timo Hatanpää and Mikko Ritala. These collaborations have further enhanced his research and development efforts in the field.

Conclusion

Anton Vihervaara is a distinguished inventor whose work in vapor deposition technologies has led to significant advancements in material science. His patents reflect a commitment to innovation and excellence in the field.