Company Filing History:
Years Active: 1998
Title: Anthony S. Meyer: Innovator in Chemical-Mechanical Polishing
Introduction
Anthony S. Meyer, a renowned inventor based in San Jose, California, holds two patents that showcase his expertise in the field of chemical-mechanical polishing (CMP). His innovations have significantly contributed to the technology used in the semiconductor industry.
Latest Patents
Meyer's latest patents include:
1. **Control of chemical-mechanical polishing rate across a substrate surface** - This innovative technique allows for the precise control of the polishing rate across a substrate surface during CMP. The design features a support housing with multiple openings for dispensing pressurized fluid in a pre-configured pattern. This configuration enables uniform polishing by allowing independent control of fluid pressure for different groups of openings.
2. **Technique for improving within-wafer non-uniformity of material removal** - This patent involves a platen ring designed for use with a platen on a linear polisher. The platen ring effectively dampens fluctuations of the belt/pad assembly before it engages the platen, which in turn helps to reduce within-wafer non-uniformity and achieve a more consistent polishing rate across the wafer surface.
Career Highlights
Anthony has made significant strides in his career by working with reputable companies such as Ontrak Systems, Inc. and Lam Research Corporation. His work at these organizations has reinforced his status as an influential inventor in the polishing technology domain.
Collaborations
Throughout his career, Meyer has collaborated with esteemed professionals, including Douglas W. Young and Anil K. Pant. These partnerships have enabled him to advance his research and contribute to the development of innovative solutions in chemical-mechanical polishing.
Conclusion
Anthony S. Meyer is a pivotal figure in the field of chemical-mechanical polishing, with patents that address critical challenges in the semiconductor manufacturing process. His ongoing contributions to the industry illustrate the importance of innovation and collaboration in advancing technology.