Company Filing History:
Years Active: 1998
Title: Anthony J Corso: Innovator in Photoresist Technology
Introduction
Anthony J Corso is a notable inventor based in Flemington, NJ (US). He has made significant contributions to the field of photolithography, particularly in the development of light-sensitive compositions and antireflective coatings. With a total of 2 patents to his name, Corso's work has advanced the capabilities of photoresist materials used in various applications.
Latest Patents
Corso's latest patents include a "Light sensitive composition containing an arylhydrazo dye." This invention describes a light-sensitive positive photoresist composition that consists of a film-forming resin, a photoactive compound, a solvent, and an arylhydrazo dye. The dyed photoresist is designed to reduce linewidth variation of the resist pattern on reflective substrates while maintaining excellent lithographic performance. Another significant patent is the "Antireflective coating for photoresist compositions." This invention relates to a novel antireflective coating solution and a process for its application in photolithography. The solution comprises a unique polymer and an organic solvent or a mixture of organic solvents, where the polymer includes a unit containing a dye that absorbs light from about 180 nm to about 450 nm, along with a unit containing a crosslinking group.
Career Highlights
Corso is currently associated with Clariant Finance (BVI) Limited, where he continues to innovate in the field of materials science. His work has been instrumental in enhancing the performance of photoresist materials, which are critical in the semiconductor manufacturing process.
Collaborations
Throughout his career, Corso has collaborated with esteemed colleagues such as Shuji Ding and Ping-Hung Lu. These collaborations have further enriched his research and development efforts, leading to advancements in photolithography technologies.
Conclusion
Anthony J Corso's contributions to the field of photolithography through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in photoresist technology, showcasing his dedication to innovation and excellence.