Company Filing History:
Years Active: 1994-1997
Title: The Innovations of Anthony Canize
Introduction
Anthony Canize is a notable inventor based in Flemington, NJ (US). He has made significant contributions to the field of photoresist compositions, holding a total of 2 patents. His work is characterized by innovative approaches to materials used in photolithography.
Latest Patents
Canize's latest patents include a positive photoresist composition that features a mixed ester of a photosensitizer. This photosensitizer comprises a trishydroxyphenylethane in a ratio of 80/20 to 50/50 with 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone in a ratio of 0/100 to 20/80 with 2,1,5-/2,1,4-diazonaphthoquinone sulfate. The composition also includes a water-insoluble, aqueous alkali-soluble novolak resin, which is present in an amount sufficient to form a substantially uniform photoresist composition. Additionally, he has developed a mixture of at least two novolak resins with a molecular weight distribution overlap of at least 50%, having dissolution rates that differ by a factor of at least 2.0.
Career Highlights
Anthony Canize is currently employed at Hoechst Celanese Corporation, where he continues to innovate in the field of materials science. His work has been instrumental in advancing the technology used in photolithography processes.
Collaborations
Canize has collaborated with notable colleagues such as Ping H Lu and Dinesh N Khanna, contributing to a dynamic research environment that fosters innovation.
Conclusion
Anthony Canize's contributions to the field of photoresist compositions highlight his role as a significant inventor. His innovative patents and collaborations reflect his commitment to advancing technology in materials science.