Anne M Mooring

Title: The Innovations of Anne M Mooring

Introduction

Anne M Mooring is a prominent inventor based in Morristown, NJ (US). She has made significant contributions to the field of photoresist compositions, holding a total of 4 patents. Her work focuses on developing advanced materials for lithography processes, which are essential in the manufacturing of semiconductors and other electronic components.

Latest Patents

Mooring's latest patents include innovative deep u.v. photoresist compositions that utilize photosensitizers containing saturated and unsaturated polycyclic compounds. These compounds feature the cyclopentane-2-diazo-1,3-dione structural unit, which has a maximum u.v. absorption at around 248 nm. Upon irradiation, these compounds decompose into polar products, making them suitable for use as photosensitizers in positive deep u.v. or excimer laser lithography. They are particularly effective when combined with deep u.v. transparent resins for forming photoresists.

Career Highlights

Anne M Mooring is currently employed at Hoechst Celanese Corporation, where she continues to push the boundaries of innovation in her field. Her expertise in photoresist technology has positioned her as a key player in the development of materials that enhance the efficiency and effectiveness of lithography processes.

Collaborations

Throughout her career, Mooring has collaborated with notable colleagues, including Chengjiu Wu and James T Yardley. These partnerships have contributed to her success and the advancement of her research in photoresist compositions.

Conclusion

Anne M Mooring's contributions to the field of photoresist technology exemplify her innovative spirit and dedication to advancing materials science. Her patents and ongoing work at Hoechst Celanese Corporation continue to influence the industry and pave the way for future advancements.