Jena, Germany

Anne Gärtner

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anne Gärtner. Retrieved from https://idiyas.com/inventor/anne-gärtner

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Anne Gärtner and Reflection-Reducing Layer Technology

Introduction

Anne Gärtner is an inventor associated with Jena, Germany, and Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Her patent work concerns a reflection-reducing layer system designed to combine optical performance with an electrically conductive surface.

Latest Patents

Gärtner is named on 1 patent: “Reflection-reducing layer system with an electrically conductive surface and method for producing a reflection-reducing layer system.” In one embodiment, the system is arranged on a substrate, with an electrically conductive surface facing away from the substrate. A nanostructure made up of multiple side-by-side pillars lies between the substrate and that surface.

Career Highlights

The patent reflects work on layered materials that bring together reflection reduction and electrical conductivity. Its described structure places a pillar-based nanostructure within the layer system, offering a specific approach to designing functional surfaces.

Collaborations

Gärtner’s listed coworkers include Astrid Bingel and Ulrike Schulz. The patent is associated with Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Conclusion

Anne Gärtner’s recorded invention focuses on a nanostructured, reflection-reducing layer system with an electrically conductive surface, highlighting her contribution to materials and surface technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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