Dresden, Germany

Anna Tchikoulaeva

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2011-2012

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Anna Tchikoulaeva: Innovator in Photolithography

Introduction

Anna Tchikoulaeva is a prominent inventor based in Dresden, Germany. She has made significant contributions to the field of photolithography, particularly through her innovative patents. With a total of 2 patents, Tchikoulaeva has established herself as a key figure in semiconductor technology.

Latest Patents

Her latest patents focus on fluorine-passivated reticles for use in lithography. These patents detail methods for fabricating and utilizing such reticles. One embodiment describes a method for performing photolithography that involves placing a fluorine-passivated reticle between an illumination source and a target semiconductor wafer. This process allows electromagnetic radiation to pass through the reticle to the wafer, enhancing the precision of the lithography process. Another embodiment outlines the structure of a fluorine-passivated reticle, which includes a substrate and a patterned fluorine-passivated absorber material layer.

Career Highlights

Anna Tchikoulaeva is currently employed at Advanced Micro Devices Corporation, where she continues to push the boundaries of innovation in semiconductor technology. Her work has been instrumental in advancing the capabilities of photolithography, which is crucial for the manufacturing of integrated circuits.

Collaborations

Throughout her career, Tchikoulaeva has collaborated with notable colleagues, including Harry Jay Levinson and Uzodinma Okoroanyanwu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Anna Tchikoulaeva's contributions to the field of photolithography exemplify her dedication to innovation and excellence. Her patents not only advance technology but also pave the way for future developments in semiconductor manufacturing.

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