Title: Anja Rietig - Innovator in Silicon Material Processing
Introduction
Anja Rietig is an accomplished inventor based in Schipkau, Germany. She is currently associated with Adensis GmbH, where she focuses on innovative methods for processing silicon materials. Despite having no granted patents to her name, her contributions to the field are noteworthy.
Latest Patent Applications
Anja Rietig has filed a patent application titled "Method for Removing Fine-Grain Silicon Material from Ground Silicon Material and Apparatus for Carrying Out the Method." This application describes a method and apparatus for effectively removing fine-grain silicon material from coarse-grain ground silicon material. The process involves selecting ground silicon material that predominantly exhibits a brown color in an aqueous suspension, indicating a significant fraction with a grain size of less than 0.25 μm. The ground silicon material is then supplied to a reaction vessel, where an aqueous or water-containing solution of a base is added. This initiates an etching process that chemically removes fine fractions with a grain size of less than approximately 1 μm. Following this, acid or water is added to terminate the etching process, leading to rapid sedimentation of a relatively coarse-grain solid, which can be removed for further processing. The solution formed above the coarse-grain solid can also be withdrawn for additional applications.
Conclusion
Anja Rietig's innovative approach to silicon material processing showcases her dedication to advancing technology in this field. Her work at Adensis GmbH and her latest patent application reflect her commitment to innovation and problem-solving in material science.