Anish Goel

Title: Anish Goel: Innovator in Fullerenic Structures

Introduction

Anish Goel is a prominent inventor based in Washington, DC. He has made significant contributions to the field of materials science, particularly in the development of fullerenic structures. With a total of 2 patents to his name, Goel's work has the potential to impact various applications in nanotechnology and materials engineering.

Latest Patents

Goel's latest patents focus on fullerenic structures and their tethering to carbon materials. These fullerenic structures include fullerenes with molecular weights less than that of C, with the exception of C, as well as fullerenes with molecular weights greater than C. Notable examples of these fullerenes include C, C, C, and C. His patents disclose methods for chemically bonding fullerenic structures to carbon surfaces, which involve adding functionalized fullerenes to a liquid suspension containing carbon material, drying the suspension to produce a powder, and heat treating the powder.

Career Highlights

Anish Goel is affiliated with the Massachusetts Institute of Technology, where he continues to advance his research in materials science. His innovative work has garnered attention in academic and industrial circles alike, showcasing the importance of fullerenic structures in modern technology.

Collaborations

Goel has collaborated with notable colleagues such as Jack B Howard and John B Vander Sande. These partnerships have further enriched his research and contributed to the development of new technologies in the field.

Conclusion

Anish Goel's contributions to the field of fullerenic structures demonstrate his commitment to innovation and research. His patents and collaborations highlight the potential of these materials in various applications, paving the way for future advancements in technology.