Anil Mane

Title: Anil Mane: Innovator in Tungsten Film Technology

Introduction

Anil Mane is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of semiconductor technology. He holds 2 patents that focus on methods for depositing thin tungsten films with low resistivity and robust micro-adhesion characteristics. His work is essential for advancing the performance of electronic devices.

Latest Patents

Anil Mane's latest patents include innovative methods for forming low resistivity tungsten films that exhibit good uniformity and adhesion to underlying layers. These methods involve creating a tungsten nucleation layer using a pulsed nucleation layer process at low temperatures. The treatment of the deposited nucleation layer prior to the bulk tungsten fill significantly lowers the resistivity of the tungsten film. In certain embodiments, the nucleation layer is deposited using a boron-based chemistry without hydrogen. Additionally, the treatment operations expose the nucleation layer to alternating cycles of a reducing agent and a tungsten-containing precursor. These methods are particularly useful for depositing films in high aspect ratio and narrow features, ensuring low resistivity at narrow line widths and excellent step coverage.

Career Highlights

Anil Mane is currently employed at Novellus Systems Incorporated, where he continues to innovate in the field of semiconductor manufacturing. His expertise in tungsten film deposition techniques has positioned him as a key player in the industry.

Collaborations

Anil has collaborated with talented coworkers such as Anand Chandrashekar and Mirko Glass, contributing to the advancement of technology in their field.

Conclusion

Anil Mane's contributions to tungsten film technology demonstrate his commitment to innovation and excellence in semiconductor manufacturing. His patents reflect a deep understanding of material science and engineering, paving the way for future advancements in electronic devices.