Neenah, WI, United States of America

Andy J Meyer


 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2019-2021

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovations of Andy J Meyer

Introduction

Andy J Meyer is an accomplished inventor based in Neenah, WI (US). He holds 2 patents that showcase his expertise in the field of absorbent articles. His innovative work has contributed significantly to advancements in materials used in various applications.

Latest Patents

Meyer’s latest patents include an absorbent article containing a porous polyolefin film. This invention features a polyolefin film formed by a thermoplastic composition that includes a polyolefin matrix polymer and a nanoinclusion additive. The unique interaction of the nano-scale phase domains with the matrix creates a network of nanopores, enhancing the absorbent properties of the article. Another notable patent is for an absorbent article containing a nonwoven web formed from porous polyolefin fibers. Similar to his first patent, this invention utilizes a thermoplastic composition that incorporates a polyolefin matrix polymer and a nanoinclusion additive, resulting in improved absorbency through the creation of nanopores.

Career Highlights

Throughout his career, Andy J Meyer has worked with prominent companies such as Kimberly-Clark Worldwide, Inc. and Kimberly-Clark Corporation. His experience in these organizations has allowed him to refine his skills and contribute to significant innovations in absorbent technology.

Collaborations

Meyer has collaborated with talented individuals in his field, including Vasily Aramovich Topolkaraev and Ryan J McEneany. These partnerships have fostered a creative environment that has led to the development of groundbreaking inventions.

Conclusion

Andy J Meyer is a notable inventor whose contributions to absorbent technology have made a lasting impact. His innovative patents and collaborations reflect his dedication to advancing materials science.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…